Eurovac deposition system
Repsonsible:
Vladimir
Krasnov,
Stefan
Rosén
New procedure when using SiO2 sputter target!
2011-03-16, Stefan Rosén, A. Liljeborg
The sputtering of SiO2 is causing subsequent sputtering of
gold to generate flakes falling of the surfaces. The gold will not
stick to surfaces covered with SiO2. To remedy this a
sticking layer of titanium must be deposited after each
SiO2 sputtering.
-
Always sign in the Logbook.
-
Gold does not stick on the SiO2.
-
Before Gold deposition check the logbook and if necessary start with
about 5 nm Ti deposition.
End of new procedure when using SiO2 sputter target.
Short description how to use sputter guns
Manual for thickness monitor (pdf)
| New tool factor =
| old tool factor × measured film thickness
|
|
| desired film thickness
|
Short user guide
Overview image of the system
Loading Sample:
- Put samples on the sample holder and make sure they are secure.
- Check if small turbo pump is running.
If NO go to step 5
- Close the valve to the small turbo pump.
- Turn off the small turbo pump.
- Open the two valves to let nitrogen into the load-lock
- When load-lock opens, close the nitrogen valves.
- Attach the Sample holder to the transfer rod (Using fresh gloves and the turbo-pump safety plate),
check that all 3 clamps are ok.
- Close load-lock
- Open the valve for the small turbo pump.
- Start the small turbo pump while gently holding load lock tight
- When turbo controller says "normal operation" the pump down
is finished (check the pressure in load-lock. Should reach its minimum
value, about 2×10-2)
- Open valve into main chamber
- Transfer sample from rod to internal holder (make sure internal holder is
at 270°, and not locked)
- Remove the transfer rod
- Close main chamber valve
Depositing
There are silver colored labels with numbers from 1-6,
placed on the various handles, levers, etc. on the system.
These labels are indicated in brackets in the following description.
Select what metal to deposit, selected by turning
long red handle with holes
at the front. There is a list of which metals are at
which positions on the wall. There are 12 turns between adjacent
positions for each metal.
-
Crucible no. 1 is selected when the end of the
thread is visible in the hole closest to the chamber.
- Crucible no. 5 is selected when the end of the thread is even
with the end of the red handle.
- Check logbook: if SiO2 has been sputtered always
start deposit 5 nm Ti.
- Make sure that correct material (crucible) and deposition program are selected
- Turn the sample to 0°.
- Close sample shutter
- Open Target shutter [4]
- Turn on main e-gun power supply (check that cooling water is on) [1]
- Turn on sweep control [2]
- Turn on gun current [3]
- Slowly increase the filament current (steps of 0.10 with 20 sec wait in between) [5]
- After reaching 1.0 start increase continuously (but still slowly) until you get a stable rate.
- Open sample shutter and at the same time press "zero" on
the thickness monitor [6]
- Close window shutter to avoid depositing material on view port
- Change angle if desired
- When desired thickness is achieved, close the Sample shutter
- Turn down current
- Turn off gun current
- Turn off sweep control
- Turn off main e-gun power supply (keep the cooling water on)
Unloading
- Open window shutter
- Close target shutter
- Open sample shutter
- Rotate sample holder to 270°
- Open main chamber valve
- Insert transfer rod
- Remove sample holder
- Close main chamber valve
- Close pump valve
- Turn off pump
- Open nitrogen valves
- When load lock opens, close nitrogen valves
- Take out sample holder (Using fresh gloves)
- Close load lock
If you will use system again within a few minutes you can leave it
like this.
Otherwise go on:
- Open pump valve
- Start Pump
- Open pump valve all the way
If you or someone will use system later that day you can leave it like
this.
If no one is going to use the system (as far as you know) continue below.
- When pump controller says "Normal operation" close pump valve
- Turn of pump
Upper part of electronics rack showing:
| Thickness monitor
|
Pressure meter for airlock and chamber
|
Turbo pump control for main chamber
|
Turbo pump control for airlock
| |
Main chamber with metal selector.
Cooling water valves.
Lower part of rack, showing sweeper and e--gun mains switch.
Close-up view showing the different valves and shutters
View from different angle of central parts of the deposition system.
Through viewport, empty sample holder.
Through viewport, sample rotated downwards, sputtering active.
Cesar
600 W RF power generator manual (pdf) for sputtering target. Limited access.
Cesar
auto-matching unit manual (pdf) for sputtering target. Limited access.
Short description how to use sputter guns
Service, cleaning, 2005-10-14
E-gun, melted leads to filament, 2004-05-28
E-gun, arcing, 2004-02-11
Movie of loading (MPEG4, .mp4)
Courtesy
of Daniel Öijerholm-Ström, taken with cell-phone camera.
Anders Liljeborg
Nano-Fab-Lab, KTH.