- AJA International ATC1800 Hybrid
- Process gases: Ar, N2, O2
- Holder for max 100mm wafers, adapter for smaller chips
- Electron beam evaporation with linear 6 pocket
hearth, 6 kW power supply
- Two direct sputtering guns, DC up to 1.5kW and
RF up to 600W
- Ion gun for in-situ pre-cleaning
- Oxidation in load lock
General rules:
- No unsecured/loose samples
- The sample holder should be stored in the load lock,
and the load lock should be pumped after processing
- Max 200 nm film thickness per session
User Instructions
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