| Part of exposure test pattern made with EBL (Raith 150). The focused ion beam has been used to drill a rectangular hole in the pattern. |
| Part of exposure test pattern made with EBL (Raith 150). The focused ion beam has been used to drill a rectangular hole in the pattern. |
| Same procedure, a rectangular hole made with the ion beam, this time the test pattern has been plated with chromium before the ion-milling. |
| More of the same, different test pattern. |
| An example of the excellent imaging capability of the FEI-system, here used to evaluate the quality of the EBL test pattern. |
| Maximum achievable resolution in Immersion Mode. |
| A zone plate manufactured with EBL on a membrane, large rectangular hole made with ion-beam milling. Focus not optimised. |
| Close up of the same area, focus is here optimised. |
| A circular deposition of Platinum made with the ion-beam, next to the rectangular hole. The small pillars are rests from the plating process used to manufacture the zone plate. |
| A large hole milled with ion-beam near the center of the zone plate. |