XR-1541
6% solution
Spin-speed vs. resist
thickness:
1000 rpm – 1900 Ang
2000 rpm – 1337 Ang
3000 rpm – 1108 Ang
4000 rpm – 972 Ang
5000 rpm – 883 Ang
2% solution
Spin-speed vs. resist
thickness:
velocity------acceleration-------time-------thickness
2000 rpm----1000 rpm/s-------60s-------450 A
3000 rpm----1500 rpm/s-------60s-------390 A
4000 rpm----2000 rpm/s-------60s-------353 A
5000 rpm----3000 rpm/s-------60s-------323 A
5000 rpm----5000 rpm/s-------90s-------287 A
1% solution on 1" pieces
Spin-speed vs. resist
thickness:
velocity------acceleration-------time-------thickness
1000 rpm----500 rpm/s--------60s-------278 A
2000 rpm----1000 rpm/s-------60s-------196 A
3000 rpm----1500 rpm/s-------60s-------178 A
4000 rpm----2000 rpm/s-------60s-------151 A
5000 rpm----2500 rpm/s-------60s-------139 A
1% solution on 4" wafer
Spin-speed vs. resist
thickness:
velocity------acceleration-------time-------thickness
3000 rpm----1500 rpm/s-------60s-------165 A
5000 rpm----2500 rpm/s-------60s-------116 A
Important Note:
HSQ is sensitive to the time between coating and exposure. It is best to expose immmediately after coating samples.
Develop process:
We currently use two develop processes. One is a "normal" process and the other is a "high contrast" process.