Bosch process using CryoRIE

Adrian Iovan 2018-03-09

Bosch process developed on the Oxford Plasmalab 100 with ICP.

 


The recipe "bosch" with its steps. Initial etch CF4/O2, then repeat 350 times etching and passivation, using SF6 and CHF3.

 


Initial etch using CF4 and a small amount of O2.

 


Etching step using SF6 and O2.

 


Passivation step using CHF3.

Some results

Mask used in these examples is 200 nm of Aluminium for a 300 µm etch.

 


 


 


 


 


 


Adrian Iovan, Anders Liljeborg Albanova Nanofabrication Lab, KTH, SU.