Reactive Ion Etch (RIE)
with Inductive Coupled Plasma (ICP)

Cold Startup of RIE system

Here is a description of a complete startup of the RIE system, from a total shutdown.
It is about half-an-hour of warm-up time before it can be used!

Here is a step-by-step list to start the system from complete standstill.

  1. Turn on the mains power switch located in the pump-room

  2. Open the nitrogen purge valve. It should be opened so the pressure reads 2 bars.
    Note that the turning direction is opposite to an ordinary valve or faucet. You turn it clockwise to open it. You close it by turning anti-clockwise until the knob is at its outermost position.

  3. Turn on the cooling water system. Here is an overview of the cooling system which really is a heat exchanger using the central cooling medium at KTH campus.

    Inside of the left door is the mains switch to turn on. Here it is shown in the ON-position. To the right is the standby switch which should be turned from the "0" (zero) position to the "AUT" position.

    Above the standby switch (to the left in the image below) is a temperature readout for six different temperature sensors. They can be selected for readout with the "+" and "-" buttons. The sensors are positioned like this:

    In the center is the programmable regulator for temperature and pressure (pump speed), to the right is a fault indicator panel.
    At the lower right is a meter for the pressure inside the closed secondary cooling loop going to the RIE.
    The pressure MUST be between 1.5 bars and 2.5 bars. If it is not; do not start the system, call the lab-manager.

  4. Go into clean room
  5. Turn on mains power switch on RIE system

  6. Turn on computer and screen

  7. Start PC2000 software and log on as a valid user. The system manager must earlier have provided you with a user-name and password to be able to use the RIE.

  8. Switch to pump page (usually default)
  9. Click on icon for rotary pump to start it

  10. Click on Stop button, then on Evacuate button

  11. The turbo pump should start after some 30 seconds and the text "At speed" should be displayed and the grey circle in the text field should be yellow

  12. Wait half an hour for Cm gauge to warm up
  13. Load sample
  14. Select recipe
  15. Remember to turn on the noisy RF generators before trying to strike a plasma. The buttons are placed at the lower right of the front panel of the RIE system.

  16. Start etching, run recipes
  17. When you are done etching, please turn off the RF-generators. By this time you have already noticed that they are quite noisy.

Shutdown of RIE system

  1. Close the chamber, and set it under some vacuum in order to avoid dust and contaminations inside:

  2. Click on rotary pump to stop it. This automatically shuts down the Turbo also.

  3. Exit program
  4. Shut down Windows, computer, and screen.
  5. Turn off mains power switch on RIE system

  6. Close the N2 purge valve by turning it counter clockwise so that it reaches it outermost position.

  7. Turn off the cooling system by turning the lower right switch to the "0" (zero) position. Then turn the cooling system mains switch (inside cabinet) also to "0" (zero) position

  8. Turn off the mains switch

Back to Introduction


Anders Liljeborg, Nanostructure Physics, KTH.


Oxford Plasma Technology PlasmaLab 80 Plus RIE/ICP