X-ray imaging with x-ray nanobeams is rapidly developing area at
synchrotron radiation and x-ray free-electron laser facilities around
the world. The unique quality of x-ray nanobeam imaging is the
opportunity for direct in-situ and in-operandi experiments exploring
very challenging physical environments and giving direct correlation
between structure and physical properties
KTH focuses on the design and manufacturing of diffractive zone plate optics, with diffraction-limited resolution in the 10 - 100 nm range, for nanobeam imaging in the soft and hard x-ray range. The fabrication is carried out by electron beam lithography and high aspect ratio etching based processes.
Keywords: X-ray optics; Manufacturing; Electron beam lithography; Nanofabrication;
For more information, see: X-ray optics and nano imaging research