- AJA International Orion ion mill with Kaufman 75mm ion gun
- Process gas: Ar
- Holder for max 100mm wafers, adapter for smaller chips
- Beam voltage up to 1000 V
- Acceleration voltage <200 V
- Max beam current dependent on beam voltage, max 290 mA at 1000 V
General Rules:
- No etching of toxic materials
- No unsecured/loose samples
- The ion gun must be purge and allowed to
cooldown after etching for at least 10 minutes
before venting the chamber
- The sample holder should be stored in the chamber,
and the chamber should be pumped after processing
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