AJA II ATC2200 sputtering system
Responsible:
Julien
Zichi,
Adrian
Iovan
Main differences from AJA Orion:
- Three inch sputter targets
- Bigger main vacuum chamber
- Two magnetron sputter guns
- Only used for Ti and Nb in order to avoid cross
contamination
- Process gases N2, Ar, O2
- Cryo pump instead of turbo pump on main chamber
Overview
Detailed instructions
Water
cooling circuit, filter exchange, flow rate
Julien Zichi, QNP, Anders Liljeborg
Albanova Nanolab, KTH, SU.