Anneal
Moorfield vacuum annealer
Responsible:
Erik Holmgren
Vacuum annealing system optimised for the thermal treatment of 2D materials and wafers under controlled atmospheres.
Base pressure < 5 × 10
-7
mbar.
Heating up to 1000 °C
Heating control resolution is ±1 °C
Controlled atmospheres, three gases, three MFC:s. Gases Ar, O
2
, N
2
.
Touch screen control of all processes.
Condensed user manual
Manufacturers manual
Images from inside chamber
courtesy of Moorfield web site.
Anders Liljeborg
Albanova Nanolab
