SEM images and Pt deposition on AFM-tips

Anders Liljeborg, 2014-05-12

All images and depositions done with FEI Nova 200.
All cantilevers were mounted on a 45° sample holder.

Continued trials with e-beam depositioning.

 


A tip used only once, imaged in immersion mode. Tip is Tap300Al-G from Budget Sensors, 300 kHz, 40 N/m.

 


Overview of same tip.

 


An unused tip of same type: Tap300Al-G, Budget Sensors, 300 kHz, 40 N/m.

 


Overview of same tip.

 


Very old tip that came with the used Veeco Dimension 3100 system from TFE, Linköping. Tip is for electrostatic force measurements, type EFM-16, coating Ptlr5, made by Nanosensors, Germany.

The tip is probably used, not very sharp.

 


Close up of tip.

 


The tip after it has been imaged with the ion-beam for a while, ion current 10 pA, 30 kV.

 


Here a trial with smallest ion current (1 pA) to deposit a small pillar of platinum, nominal diameter 50 nm. No deposition can be seen.

 


Here ion current has been increased to 100 pA, and a one micron dot was deposited. Not good at all. It seems the ion-beam is deposition the platinum but at the same time also milling it away.

 


A couple of more trials with ion-beam Pt-deposition at 100 pA has changed the shape of the tip, compare with previous picture.

Then E-beam deposition is used, immersion mode, both for deposition and imaging. A small square with a nominal height of 5 µm can be seen below the top.

 


Switched E-beam voltage to 17 kV, and did same small square, below the first one.

 


Here a image taken with ion-beam, 10 pA, for a quick look at how the ebeam deposition worked. The length of the deposited pillar is about one micron, far from the nominal value of five microns.

Continued trials with e-beam depsoitioning.


Anders Liljeborg Nanostructure Physics, KTH.