Reactive Ion Etch (RIE)
with Inductive Coupled Plasma (ICP)

Operating Manual

Chamber open

Here the chamber is open. The chamber lid together with the ICP unit has been lifted and rotated to the left by a cylinder powered by compressed air.

The chamber opening is controlled by the two outer blue buttons and the black turning knob to the left. First the knob is positioned for the desired operation, open or close. Then the two blue buttons must be pressed and held down simultaneously until the operation is completed.

NOTE! The chamber lid is quite heavy, keep all objects such as hands, fingers, tools etc. away from the chamber area, especially when closing the chamber.

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Anders Liljeborg, Nanostructure Physics, KTH.