• Blue light illumination, 430 - 470 nm, power 11 mW.
• Compatible with g-line photoresists, typical AZ1512HS, AZ4562, AZ9260.
• Flat substrates up to 100 mm diameter.
• Design: 1920×1080 B&W or grayscale bitmap.
• Design tonality inversion.
• Grayscale lithography
• Alignment mode with green light illumination.

Objective	Field of view [mm]	Pixel size or precision [µm]	Min feature size [µm]
× 0.5	25.6 × 14.4	13.3	40
× 1	13.6 × 7.7	7.7	23
× 2.5	5.4 × 3	2.8	8
× 5	2.7 × 1.5	1.4	4
× 10	1,35 × 0.75	0.7	2

Manufacturers Manual

How to convert a CAD drawing to a bitmap in an exact way.

Stitching accuracy test, 2018-03-05

Really short user manual (Thanks to Joonas Govenius):

1. Turn on projector (without a sample).
2. Start software.
3. Raise the objective all the way up.
4. Put in the objective you want to use.
5. Choose objective, resist, and substrate in software.
6. Load your design.
7. Check that the reported dimensions & pixel size make sense.
8. Tweak exposure time.
9. Set tonality (positive/negative exposure).
10. Insert a dummy sample for focusing (or focus in an unused area of your real sample).
11. Move the stage to a reasonable place for focusing.
12. Choose "focus mode" (as opposed to "alignment mode"), i.e., blue light.
13. Adjust height manually until you get a sharp image in "camera view".
14. Go back to "alignment mode" (green light). Note that the image should not be in focus anymore (green and blue wavelengths cannot be simultaneously focused).
15. Insert your real sample with unexposed resist.
16. Move to the area you want to expose.
    1. For best resolution, correct tilt.
    2. For precise alignment, fine tune rotation and position.
17. Expose (single pattern or matrix of patterns).
18. Turn off projector (when done)!