Positive Ebeam resist AR-P 6200.09 (CSAR 62)

• Allresist AR-P 6200 product info (CSAR 62)

• Clearing dose tests on SiN membranes, T. Frisk, H. Ohlin, 2021-11-29
  700 nm resist, 10 nm Cr, 5 nm Au.

• Clearing dose tests on SiN membranes, T. Frisk, H. Ohlin, 2019-09-11
  170 nm resist, 10 nm Cr, 5 nm Au.

• Preliminary tests at Albanova, Jussi Rahomäki

• Product information

• Earlier, preliminary info

• Success story

Contrast curves for different developers

These diagrams show the contrast for different developers, i.e. the ratio of resist thickness before and after development for exposed areas. "D" is resist thickness after exposure, "D0" is resist thickness before development. Here contrast is called "gradation".