Resists

• CSAR 62, AR-P 6200.09, replacement for ZEP520A
• mr-Rem 700, better replacement for Remover 1165 (PDF).
• mr-Rem 400, mr-Rem 500, replacements for Remover 1165 (PDF).
• mr-rem-400 lift-off, first trial
• Ebeam resist, positive, ZEP7000
• ZEP520A, PDF
• LOR 5B restricted access
• S1800 G2 series resists, PDF
• S1800 series resists, PDF
• S1813 spin curve
• XR-1541 Hydrogen silsesquioxane negative resist
• XR-1541 spin speeds and development, (gatech.edu)
• ma-N 2405 (03) negative resist New developer ma-D 525
• Overview of negative resists
     Documents about ma-N 240X
  • ma-N 2401 (100 nm thickness)
  • Spin curves, bake temps., contrast curves (PDF), a concentration of data in the documents below.
  • Spin-curves contributed by Ilya Sychugov
  • Nanometer and high aspect ratio patterning..., Elsner, Meyer (PDF)
  • Evaluation of ma-N 2400 series DUV Photoresist..., Elsner, Meyer, Voigt, Grützner (PDF)
  • Poster from Micro Resist Technology (PDF)
     Documents about ma-N 140X
  • Spin curve 1407
  • Processing guide-lines (PDF)
  • Poster from MRT (PDF)
  • Poster about lift-off (PDF)
  • Genreal info from MRT

• Material Safety Data Sheet for Microposit 351 developer PDF-file

• Micro Resist Technology products (PDF:s)
  Most of these products are not available in the NanoFabLab, but listed here as general information.
  • Negative resists, ma-400, ma-1400
  • Positive resists
  • Nano-imprint products
  • Ormocer, micro optics
  • Optical resists, overview, Rohm & Haas